![]() SSB500/40 |
![]() SSB500/50 |
● Excellent Contamination Prevention
● Strong Process Adaptability
● High Precision
● High Throughput
Model |
SSB500/40 |
SSB500/50 |
Resolution |
2μm |
1μm |
Light Source |
ghi-line/gh line/i-line mercury |
ghi-line/gh line/i-line mercury |
Wafer Size |
200mm/300mm |
200mm/300mm |
Options |
IR or visible light backside alignment Wafer edge exposure |
IR or visible light backside alignment Wafer edge exposure |