600 Series Scanner —— IC Front-end Manufacturing


SSA600/20

SSC600/10

SSB600/10

By adopting 4X reduction ArF projection lens, self-adaptive focusing and leveling technology and high-speed & high-precision 6 DOF wafer/reticle stage, 600 series scanner is designed for both critical and non-critical layers at 90-nm node, 110-nm node and 280-nm node. 600 series scanner enables mass production of both 200-mm and 300-mm wafers.
   Specifications
 Model  SSA600/20  SSC600/10  SSB600/10
 Resolution  90nm  110nm  280nm
 Light Source  ArF excimer laser  KrF excimer laser  i-line mercury lamp
 Magnification  1:4  1:4  1:4
 Wafer Size  200mm/300mm  200mm/300mm  200mm/300mm